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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - The effect of resist material composition on development behavior

Wallow, Thomas I., Hohle, Christoph K., Minegishi, Shinya, Itani, Toshiro

Year:

2015

Language:

english

File:

PDF, 849 KB

english, 2015

2

Internet-based treatment for social phobia: a randomized controlled trial

Thomas Berger, Eléonore Hohl, Franz Caspar

Journal:

Journal of Clinical Psychology

Year:

2009

Language:

english

File:

PDF, 216 KB

english, 2009

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - EUV resists based on tin-oxo clusters

Wallow, Thomas I., Hohle, Christoph K., Cardineau, Brian, Del Re, Ryan, Al-Mashat, Hashim, Marnell, Miles, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Neisser, Mark, Freedman, Daniel A., Bra

Year:

2014

Language:

english

File:

PDF, 875 KB

english, 2014

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Advanced patterning approaches based on negative-tone development (NTD) process for further extension of 193nm immersion lithography

Wallow, Thomas I., Hohle, Christoph K., Shirakawa, Michihiro, Inoue, Naoki, Furutani, Hajime, Yamamoto, Kei, Goto, Akiyoshi, Fujita, Mitsuhiro

Year:

2015

Language:

english

File:

PDF, 4.89 MB

english, 2015

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Modeling of NTD resist shrinkage

Hohle, Christoph K., Gronheid, Roel, Mülders, Thomas, Stock, Hans-Jürgen, Küchler, Bernd, Klostermann, Ulrich, Gao, Weimin, Demmerle, Wolfgang

Year:

2017

Language:

english

File:

PDF, 1.00 MB

english, 2017

6

Effects of focus and definiteness on children's word order: evidence from German five-year-olds' reproductions of double object constructions

HÖHLE, BARBARA, HÖRNIG, ROBIN, WESKOTT, THOMAS, KNAUF, SELENE, KRÜGER, AGNES

Journal:

Journal of Child Language

Year:

2014

Language:

english

File:

PDF, 360 KB

english, 2014

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - A comprehensive approach for micro and multiple bridges mitigation in immersion photolithography

Wallow, Thomas I., Hohle, Christoph K., D'Urzo, L., Schollaert, W., Buch, X., Stokes, H., Thouroude, Y.

Year:

2015

Language:

english

File:

PDF, 788 KB

english, 2015

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Microbridge reduction in negative-tone imaging at photoresist point-of-use filtration

Wallow, Thomas I., Hohle, Christoph K., Umeda, Toru, Yamanaka, Tsukasa, Iguchi, Naoya, Tsuzuki, Shuichi

Year:

2015

Language:

english

File:

PDF, 697 KB

english, 2015

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Chemical shrink materials and process for negative tone development (NTD) resist

Wallow, Thomas I., Hohle, Christoph K., Miyamoto, Yoshihiro, Sagan, John, Padmanaban, Munirathna, Pawlowski, Georg, Nagahara, Tatsuro

Year:

2014

Language:

english

File:

PDF, 438 KB

english, 2014

10

Neuroforaminal chondrocyte metaplasia and clustering associated with recombinant bone morphogenetic protein-2 usage in transforaminal lumbar interbody fusion

Christensen, Thomas J., Annis, Prokopis, Hohl, Justin B., Patel, Alpesh A.

Journal:

The Spine Journal

Year:

2014

Language:

english

File:

PDF, 1.91 MB

english, 2014

11

Predicting psychologic responses to orthognathic surgery

Kiyak, H.Asuman, McNeill, R.William, West, Roger A., Hohl, Thomas, Bucher, Foster, Sherrick, Patricia

Journal:

Journal of Oral and Maxillofacial Surgery

Year:

1982

Language:

english

File:

PDF, 679 KB

english, 1982

12

Masticatory muscle transposition in primates: Effects on craniofacial growth

Hohl, Thomas H.

Journal:

Journal of Maxillofacial Surgery

Year:

1983

Language:

english

File:

PDF, 3.76 MB

english, 1983

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Chiral nanomaterial fabrication by means of on-edge lithography

Wallow, Thomas I., Hohle, Christoph K., Dietrich, Kay, Lehr, Dennis, Puffky, Oliver, Kley, Ernst-Bernhard, Tünnermann, Andreas

Year:

2014

Language:

english

File:

PDF, 553 KB

english, 2014

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Methods of controlling cross-linking in negative-tone resists

Wallow, Thomas I., Hohle, Christoph K., Lawson, Richard A., Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.

Year:

2014

Language:

english

File:

PDF, 1.05 MB

english, 2014

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Removal of highly crosslinked resists and hybrid polymers for single micro parts fabrication and nanoimprint stamp rework

Wallow, Thomas I., Hohle, Christoph K., Voigt, Anja, Engelke, Rainer, Ahrens, Gisela, Bullerjahn, Franziska, Schleunitz, Arne, Klein, Jan J., Grützner, Gabi

Year:

2014

Language:

english

File:

PDF, 1.17 MB

english, 2014

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - ArF photoresist polymers with nitrogen or sulfone moieties for negative tone development process

Wallow, Thomas I., Hohle, Christoph K., Kim, Dong-Gyun, Kwon, Su-Jee, Hong, Suk-Koo, Lee, Joon Je, Lee, Hyung Rae, Yun, Hyo-jin, Baik, Ji-Hoon, Im, Dohyuk, Jang, Eujean, Lee, Jae-Woo, Kim, Jae-Hyun, L

Year:

2014

Language:

english

File:

PDF, 986 KB

english, 2014

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Manufacturability improvements in EUV resist processing toward NXE:3300 processing

Wallow, Thomas I., Hohle, Christoph K., Kuwahara, Yuhei, Matsunaga, Koichi, Shimoaoki, Takeshi, Kawakami, Shinichiro, Nafus, Kathleen, Foubert, Philippe, Goethals, Anne-Marie, Shimura, Satoru

Year:

2014

Language:

english

File:

PDF, 691 KB

english, 2014

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Directly patternable dielectric based on fluorinated polyimide

Wallow, Thomas I., Hohle, Christoph K., Dick, Andrew R., Bell, William K., Luke, Brendan, Maines, Erin, Mueller, Brennan, Kohl, Paul A., Rawlings, Brandon, Willson, C. Grant

Year:

2015

Language:

english

File:

PDF, 541 KB

english, 2015

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Alternative Lithographic Technologies VII - Verification of E-Beam direct write integration into 28nm BEOL SRAM technology

Resnick, Douglas J., Bencher, Christopher, Hohle, Christoph, Choi, Kang-Hoon, Gutsch, Manuela, Hanisch, Norbert, Seidel, Robert, Steidel, Katja, Thrun, Xaver, Werner, Thomas

Year:

2015

Language:

english

File:

PDF, 977 KB

english, 2015

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Novel spin-on metal hardmask materials for filling applications

Wallow, Thomas I., Hohle, Christoph K., Dioses, Alberto D., Chada, Venkata, Wolfer, Elizabeth, Ng, Edward, Mullen, Salem, Yao, Huirong, Cho, JoonYeon, Padmanaban, Munirathna

Year:

2014

Language:

english

File:

PDF, 616 KB

english, 2014

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Development of spin-on metal hardmask (SOMHM) for advanced node

Wallow, Thomas I., Hohle, Christoph K., Yamada, Shintaro, Wang, Deyan, Chuang, Vivian, Liu, Cong, Wong, Sabrina, Clark, Michael B., Cutler, Charlotte, Williams, William, Baranowski, Paul, Li, Mingqi,

Year:

2015

Language:

english

File:

PDF, 1.36 MB

english, 2015

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - How to design a good photoresist solvent package using solubility parameters and high-throughput research

Wallow, Thomas I., Hohle, Christoph K., Tate, Michael P., Cutler, Charlotte, Sakillaris, Mike, Kaufman, Michael, Estelle, Thomas, Mohler, Carol, Tucker, Chris, Thackeray, Jim

Year:

2014

Language:

english

File:

PDF, 794 KB

english, 2014

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Introduction of an innovative water based photoresist stripping process using intelligent fluids

Wallow, Thomas I., Hohle, Christoph K., Rudolph, Matthias, Thrun, Xaver, Schumann, Dirk, Hoehne, Anita, Esche, Silvio, Hohle, Christoph

Year:

2014

Language:

english

File:

PDF, 4.26 MB

english, 2014

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Fundamental study of spin-coating using in-situ analysis and simulation

Wallow, Thomas I., Hohle, Christoph K., Harumoto, Masahiko, Yoshida, Jun-ichi, Stokes, Harold, Tanaka, Yuji, Miyagi, Tadashi, Kaneyama, Koji, Pieczulewski, Charles, Asai, Masaya

Year:

2015

Language:

english

File:

PDF, 5.82 MB

english, 2015

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

Wallow, Thomas I., Hohle, Christoph K., Takei, Satoshi, Hanabata, Makoto, Oshima, Akihiro, Kashiwakura, Miki, Kozawa, Takahiro, Tagawa, Seiichi

Year:

2015

Language:

english

File:

PDF, 342 KB

english, 2015

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Effects of the statistical fluctuation of PAG and quencher on LWR of ArF resists

Wallow, Thomas I., Hohle, Christoph K., Fujita, Mitsuhiro, Shirakawa, Michihiro, Yamaguchi, Shuhei

Year:

2015

Language:

english

File:

PDF, 502 KB

english, 2015

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Aqueous-based thick photoresist removal for bumping applications

Wallow, Thomas I., Hohle, Christoph K., Moore, John C., Brewer, Alex J., Law, Alman, Pettit, Jared M.

Year:

2015

Language:

english

File:

PDF, 3.21 MB

english, 2015

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Integrated fab process for metal oxide EUV photoresist

Wallow, Thomas I., Hohle, Christoph K., Grenville, Andrew, Anderson, Jeremy T., Clark, Benjamin L., De Schepper, Peter, Edson, Joseph, Greer, Michael, Jiang, Kai, Kocsis, Michael, Meyers, Stephen T.,

Year:

2015

Language:

english

File:

PDF, 3.10 MB

english, 2015

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Top-coatless 193nm positive-tone development immersion resist for logic application

Wallow, Thomas I., Hohle, Christoph K., Liu, Lian Cong, Yeh, Tsung Ju, Lin, Yeh-Sheng, Huang, Yu Chin, Kuo, Chien Wen, Huang, Wen Liang, Lin, Chia Hung, Yu, Chun Chi, Hsu, Ray, Wan, I-Yuan, Lin, Jeff,

Year:

2015

Language:

english

File:

PDF, 535 KB

english, 2015

30

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, USA (Tuesday 11 September 2012)] Photomask Technology 2012 - Advanced module for model parameter extraction using global optimization and sensitivity analysis for electron beam proximity effect correction

Figueiro, Thiago, Abboud, Frank E., Faure, Thomas B., Choi, Kang-Hoon, Gutsch, Manuela, Freitag, Martin, Hohle, Christoph, Tortai, Jean-Hervé, Saib, Mohamed, Schiavone, Patrick

Year:

2012

Language:

english

File:

PDF, 1.10 MB

english, 2012

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography

Wallow, Thomas I., Hohle, Christoph K., Lorusso, Gian F., Mao, Ming, Reijnen, Liesbeth, Viatkina, Katja, Knops, Roel, Rispens, Gijsbert, Fliervoet, Timon

Year:

2015

Language:

english

File:

PDF, 577 KB

english, 2015

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Progress in spin-on metal oxide hardmask materials for filling applications

Wallow, Thomas I., Hohle, Christoph K., Yao, Huirong, Dioses, Alberto D., Mullen, Salem, Wolfer, Elizabeth, McKenzie, Douglas, Rahman, Dalil, Cho, JoonYeon, Padmanaban, Munirathna, Petermann, Claire,

Year:

2015

Language:

english

File:

PDF, 561 KB

english, 2015

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Total fidelity management in self-aligned multiple patterning process

Wallow, Thomas I., Hohle, Christoph K., Yamato, Masatoshi, Okabe, Noriaki, Hara, Arisa, Natori, Sakurako, Yamauchi, Shouhei, Koike, Kyohei, Oyama, Kenichi, Yaegashi, Hidetami

Year:

2015

Language:

english

File:

PDF, 915 KB

english, 2015

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

Wallow, Thomas I., Hohle, Christoph K., Takei, Satoshi, Hanabata, Makoto

Year:

2015

Language:

english

File:

PDF, 560 KB

english, 2015

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - High-volume manufacturing equipment and processing for directed self-assembly applications

Wallow, Thomas I., Hohle, Christoph K., Somervell, Mark, Yamauchi, Takashi, Okada, Soichiro, Tomita, Tadatoshi, Nishi, Takanori, Iijima, Etsuo, Nakano, Takeo, Ishiguro, Takumi, Nagahara, Seiji, Iwaki,

Year:

2014

Language:

english

File:

PDF, 5.47 MB

english, 2014

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - An in situ analysis of resist dissolution in alkali-based and organic solvent-based developers using high speed atomic force microscopy

Wallow, Thomas I., Hohle, Christoph K., Santillan, Julius Joseph, Shichiri, Motoharu, Itani, Toshiro

Year:

2014

Language:

english

File:

PDF, 4.92 MB

english, 2014

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - A physical resist shrinkage model for full-chip lithography simulations

Hohle, Christoph K., Younkin, Todd R., Liu, Peng, Zheng, Leiwu, Ma, Maggie, Zhao, Qian, Fan, Yongfa, Zhang, Qiang, Feng, Mu, Guo, Xin, Wallow, Thomas, Gronlund, Keith, Goossens, Ronald, Zhang, Gary, L

Year:

2016

Language:

english

File:

PDF, 628 KB

english, 2016

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Spin-on organic hardmask for topo-patterned substrate

Wallow, Thomas I., Hohle, Christoph K., Komura, Kazuhiko, Hishiro, Yoshi, Wakamatsu, Goji, Takimoto, Yoshio, Nagai, Tomoki, Kimura, Tooru, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu, Breyta, Greg, Arell

Year:

2014

Language:

english

File:

PDF, 477 KB

english, 2014

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Line width roughness reduction by rational design of photoacid generator for sub-millisecond laser post-exposure bake

Wallow, Thomas I., Hohle, Christoph K., Jiang, Jing, Thompson, Michael O., Ober, Christopher K.

Year:

2014

Language:

english

File:

PDF, 418 KB

english, 2014

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications

Wallow, Thomas I., Hohle, Christoph K., Voigt, Anja, Ahrens, Gisela, Heinrich, Marina, Thompson, Andrew, Gruetzner, Gabi

Year:

2014

Language:

english

File:

PDF, 1.49 MB

english, 2014

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Adsorption characteristics of lithography filters in various solvents using application-specific ratings

Wallow, Thomas I., Hohle, Christoph K., Umeda, Toru, Tsuzuki, Shuichi

Year:

2014

Language:

english

File:

PDF, 299 KB

english, 2014

42

The First Analysis and Clinical Evaluation of Native Breast Tissue Using Differential Phase-Contrast Mammography

Stampanoni, Marco, Wang, Zhentian, Thüring, Thomas, David, Christian, Roessl, Ewald, Trippel, Mafalda, Kubik-Huch, Rahel A., Singer, Gad, Hohl, Michael K., Hauser, Nik

Journal:

Investigative Radiology

Year:

2011

Language:

english

File:

PDF, 1.32 MB

english, 2011

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Characterization of chemically amplified resists for electron beam lithography

Wallow, Thomas I., Hohle, Christoph K., Yamazaki, Tomoharu, Yamamoto, Hiroki, Kozawa, Takahiro, Wang, Wen-Chuan

Year:

2014

Language:

english

File:

PDF, 1.25 MB

english, 2014

44

[Society of Petroleum Engineers IADC/SPE Drilling Conference and Exhibition - Fort Worth, Texas, USA (2018-03-06)] IADC/SPE Drilling Conference and Exhibition - A 300 Degree Celsius Directional Drilling System

Stefánsson, Ari, Duerholt, Ralf, Schroder, Jon, Macpherson, John, Hohl, Carsten, Kruspe, Thomas, Eriksen, Tor-Jan

Language:

english

File:

PDF, 2.23 MB

english

45

Differential effects of endurance, interval, and resistance training on telomerase activity and telomere length in a randomized, controlled study

Werner, Christian M, Hecksteden, Anne, Morsch, Arne, Zundler, Joachim, Wegmann, Melissa, Kratzsch, Jürgen, Thiery, Joachim, Hohl, Mathias, Bittenbring, Jörg Thomas, Neumann, Frank, Böhm, Michael, Meye

Journal:

European Heart Journal

Year:

2018

Language:

english

File:

PDF, 1.01 MB

english, 2018

46

Diaper dermatitis prevalence and severity: Global perspective on the impact of caregiver behavior

Carr, Andrew N., DeWitt, Thomas, Cork, Michael J., Eichenfield, Lawrence F., Fölster‐Holst, Regina, Hohl, Daniel, Lane, Alfred T., Paller, Amy, Pickering, Larry, Taieb, Alain, Cui, Tao Y., Xu, Zi G.,

Journal:

Pediatric Dermatology

Year:

2019

Language:

english

File:

PDF, 829 KB

english, 2019

47

The fine structure of the tegument of Tylocephalum metacestodes: With emphasis on a new type of microvilli

Erik Rifkin, Thomas C. Cheng, Hans R. Hohl

Journal:

Journal of Morphology

Year:

1970

Language:

english

File:

PDF, 1.33 MB

english, 1970

48

Variable-shaped e-beam lithography enabling process development for future copper damascene technology

Philipp Jaschinsky, Jens-Wolfram Erben, Kang-Hoon Choi, Knut Schulze, Manuela Gutsch, Frieder Blaschta, Martin Freitag, Stefan E. Schulz, Katja Steidel, Christoph Hohle, Thomas Gessner, Peter Kuecher

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 787 KB

english, 2011

49

Industrial waste water treatment: large scale development of a light-enhanced Fenton reaction

Esther Oliveros, Omar Legrini, Mathias Hohl, Thomas Müller, André M. Braun

Journal:

Chemical Engineering and Processing: Process Intensification

Year:

1997

Language:

english

File:

PDF, 972 KB

english, 1997

50

Vergleichende Messungen und Simulationen annähernd homogener Belastungsverteilungen

Thomas Alshuth, Carsten Hohl, Jörn Ihlemann

Journal:

Year:

2007

Language:

german

File:

PDF, 1.30 MB

german, 2007